Single diffusion cut for gate structures

ABSTRACT

The present disclosure relates to semiconductor structures and, more particularly, to single diffusion cut for gate structures and methods of manufacture. The structure includes a single diffusion break extending into a substrate between diffusion regions of adjacent gate structures, the single diffusion break filled with an insulator material and further comprising an undercut region lined with a liner material which is between the insulator material and the diffusion regions.

FIELD OF THE INVENTION

The present disclosure relates to semiconductor structures and, moreparticularly, to a single diffusion cut for gate structures and methodsof manufacture.

BACKGROUND

As semiconductor processes continue to scale downwards, e.g., shrink,the desired spacing between features (i.e., the pitch) also becomessmaller. To this end, in the smaller technology nodes it becomes evermore difficult to fabricate features due to the critical dimension (CD)scaling and process capabilities.

For example, in the fabrication of FinFET structures, single diffusionbreaks become very attractive in standard cell scaling. The processesfor fabricating the single diffusion breaks, though, is very challengingin these advanced technology. By way of illustration, conventionally,multiple Rx regions in a semiconductor integrated circuit typicallyinclude arrays of parallel extending fins having distal ends abuttingthe edges of each Rx region. The fin arrays are terminated by dummygates, which extend laterally across the distal ends of the fins at theedges of the Rx regions. The dummy gates are used to induce symmetricalepitaxial growth of source/drain regions (S/D regions) on the endportions of the fins located between the dummy gates and adjacent activegates.

To fabricate the single diffusion break, a deep trench undercut adjacentto the source and drain epitaxial regions are provided by removing thedummy gate structure (poly material). The deep trench etch undercutdamages or removes portions of the epitaxial source and drain regions.This results in smaller source/drain epitaxial volume and electricalcontact area compared to that of the source and drain regions locatedbetween active gates. The smaller source an drain region volume andcontact area can lead to greater contact resistance and degrade deviceperformance.

SUMMARY

In an aspect of the disclosure, a structure comprises a single diffusionbreak extending into a substrate between diffusion regions of adjacentgate structures, the single diffusion break filled with an insulatormaterial and further comprising an undercut region lined with a linermaterial which is between the insulator material and the diffusionregions.

In an aspect of the disclosure, a structure comprises: a substratematerial; a plurality of metal gate structures on the substrate materialand comprising sidewall spacers, metal material and diffusion regions;and a single diffusion break structure between adjacent metal gatestructures of the plurality of metal gate structures, the singlediffusion break structure comprises: an undercut region in thesubstrate, adjacent to the diffusion regions; a liner material liningthe undercut region; and an insulator material over the liner materialand between the adjacent metal gate structures of the plurality of metalgate structures.

In an aspect of the disclosure, a method comprises: forming a pluralityof dummy gate structures over fin structures, the plurality of dummygate structures including sidewall spacers and sacrificial material;forming sacrificial insulator material between adjacent dummy gatestructures of the plurality of dummy gate structures; forming a trenchwith an undercut region in substrate material by removing thesacrificial material of at least one of the dummy gate structures,leaving the sidewall spacers intact, and removing the substrate materialbelow the removed sacrificial material; depositing liner material onsidewalls of the sidewalls of the trench including in the undercutregion; extending the trench further into the substrate; and filling thetrench with insulator material.

BRIEF DESCRIPTION OF THE DRAWINGS

The present disclosure is described in the detailed description whichfollows, in reference to the noted plurality of drawings by way ofnon-limiting examples of exemplary embodiments of the presentdisclosure.

FIG. 1A shows a top view of an incoming structure and respectivefabrication processes in accordance with aspects of the presentdisclosure.

FIG. 1B shows a cross-sectional view along line A-A of FIG. 1A.

FIG. 1C shows a cross-sectional view along line B-B of FIG. 1A.

FIGS. 2A and 2B are cross-sectional views showing a trench, amongstother features, and respective fabrication processes.

FIGS. 3A and 3B are cross-sectional views showing a liner materialformed in the trench, amongst other features, and respective fabricationprocesses.

FIGS. 4A and 4B are cross-sectional views showing a single diffusionbreak cut lined with a liner, amongst other features, and respectivefabrication processes.

FIGS. 5A and 5B are cross-sectional views which show an insulatormaterial within the single diffusion break cut, amongst other features,and respective fabrication processes.

FIGS. 6A and 6B are cross-sectional views which show replacement metalgate structures, amongst other features, and respective fabricationprocesses.

FIG. 7 is a cross-sectional view which shows replacement metal gatestructures with a partial liner, amongst other features, and respectivefabrication processes.

DETAILED DESCRIPTION

The present disclosure relates to semiconductor structures and, moreparticularly, to a single diffusion cut for gate structures and methodsof manufacture. More specifically, the present disclosure provides asingle diffusion cut process for advanced FinFET technologies.Advantageously, the single diffusion cut processes eliminate damageand/or defects to epitaxial source/drain regions during replacementmetal gate processes, e.g., during deep trench etch processes to removethe dummy gate material. Accordingly, by implementing the processesdescribed herein, device performance can be maintained even at smallertechnology nodes, e.g., 10 nm technology node and smaller.

In embodiments, the single diffusion cut includes a dielectric layerbetween the single diffusion cut isolation and the single diffusion cutgate spacer. In embodiments, the dielectric layer is on an upper portionof the side wall of the single diffusion cut isolation. The dielectriclayer will also fill in spacer holes near the source/drain of the gatestructure, e.g., transistor.

The single diffusion cut for gate structures of the present disclosurecan be manufactured in a number of ways using a number of differenttools. In general, though, the methodologies and tools are used to formstructures with dimensions in the micrometer and nanometer scale. Themethodologies, i.e., technologies, employed to manufacture the singlediffusion cut for gate structures of the present disclosure have beenadopted from integrated circuit (IC) technology. For example, thestructures are built on wafers and are realized in films of materialpatterned by photolithographic processes on the top of a wafer. Inparticular, the fabrication of the single diffusion cut for gatestructures use three basic building blocks: (i) deposition of thin filmsof material on a substrate, (ii) applying a patterned mask on top of thefilms by photolithographic imaging, and (iii) etching the filmsselectively to the mask.

FIG. 1A shows a top view of an incoming structure and respectivefabrication processes in accordance with aspects of the presentdisclosure. FIG. 1B shows a cross-sectional view along line A-A of FIG.1A and FIG. 1C shows a cross-sectional view along line B-B of FIG. 1A.Referring to FIGS. 1A-1C, the structure 10 includes a plurality of finstructures 12 composed of any suitable substrate material 14. Inembodiments, the substrate material 14 can be composed of any suitablematerial including, but not limited to, Si, SiGe, SiGeC, SiC, GaAs,InAs, InP, and other III/V or II/VI compound semiconductors.

The fin structures 12 can be fabricated using conventional patterningprocesses including, e.g., sidewall imaging transfer (SIT) techniques.In an example of a SIT technique, a mandrel material, e.g., SiO₂, isdeposited on the substrate material 14 using conventional chemical vapordeposition (CVD) processes. A resist is formed on the mandrel materialand exposed to light to form a pattern (openings). A reactive ionetching (RIE) is performed through the openings to form the mandrels. Inembodiments, the mandrels can have different widths and/or spacingdepending on the desired dimensions between the fin structures 12.Spacers are formed on the sidewalls of the mandrels which are preferablymaterial that is different than the mandrels, and which are formed usingconventional deposition processes known to those of skill in the art.The mandrels are removed or stripped using a conventional etchingprocess, selective to the mandrel material. An etching is then performedwithin the spacing of the spacers to form the sub-lithographic features.Due to the etching process, the fin structures 12 can have a taperedprofile as shown in FIG. 1C, for example. The sidewall spacers can thenbe stripped.

Dummy gate structures 16 extend orthogonally over the fin structures 12.In embodiments, the dummy gate structures 16 are composed of polysiliconmaterial which is deposited over the fin structures 12 and patternedusing conventional lithography and etching processes such that nofurther explanation is required herein for an understanding of theformation of the dummy gate structures. A sidewall spacer material 18 isdeposited and patterned over the patterned dummy gate structures 16. Inembodiments, the sidewall spacer material 18 is a low-k dielectricmaterial deposited by a conventional CVD process, followed by ananisotropic etching process to expose the upper surface of thepolysilicon material of the dummy gate structures 16.

Diffusion regions 20, e.g., source and drain regions, are formedadjacent to the dummy gate structures 16. In embodiments, the source anddrain regions 20 can be fabricated by conventional processes includingdoped epitaxial processes to form raised source and drain regions. Inalternative embodiments, the source and drain regions 20 can be planarand subjected to ion implantation or doping processes to form diffusionregions as is known in the art. A sacrificial isolation region 22 isformed over the source and drain regions 20. The sacrificial isolationregions 22 can be, e.g., oxide, deposited by conventional CVD processes,followed by a planarization process such as a chemical mechanicalpolishing (CMP).

Still referring to FIGS. 1A-1C, a hardmask material 24 is deposited overthe sacrificial isolation regions 22 and the dummy gate structures 16.In embodiments, the hardmask material 24 is a nitride material or otherhardmask material. An opening 26 is formed in the hardmask material 24.The opening 26 is formed over the fin structures 12 shown in thecross-sectional view of FIG. 1C and over a dummy gate structure 16 shownin the cross-sectional view of FIG. 1B. The opening 26 is fabricatedusing conventional lithography and etching processes. For example, aresist formed over the hardmask material 24 is exposed to energy (light)to form a pattern (opening). An etching process with a selectivechemistry, e.g., RIE, will be used to form one or more openings 26 inthe hardmask material 24 through the openings of the resist. The resistcan then be removed by a conventional oxygen ashing process or otherknown stripants.

As shown in FIGS. 2A and 2B, a trench 28 is formed through the dummygate structure and extending into the underlying substrate 14 (e.g., finstructure 14) through the opening of the hardmask material 24 usingconventional etching processes, e.g., RIE, with a selective chemistry tothe polysilicon material and the substrate material 12. As shown in FIG.2A, for example, the etching process will remove the polysiliconmaterial of the dummy gate structure 16 and partially remove or recessthe fin structures 12. In more specific embodiments, the etching processwill recess the fin structures 12 to below a surface of the sacrificialisolation regions 22. In embodiments, the trench 28 will extend towithin the substrate 14 and below the source and drain regions 20 by adistance “d1” as shown in FIG. 2B, for example. Accordingly, the recessthe fin structures 12 will also be a distance “d1” (as shown in FIG.2A).

As shown in FIG. 2B, the etching process will remove the poly materialbetween sidewall spacer material 18 and a portion of the fin structure12 (e.g., substrate) between the source and drain regions 20. Inembodiments, the trench 28 in the fin structure 12 includes a wideropening 32 (e.g., undercut region under the fin structure 14) at thebottom portion thereof, e.g., adjacent the source and drain regions 20.The wider opening 32 can be holes in the substrate material, which areadjacent to the source and drain regions 20. The wider opening or holeswill not expose the source and drain regions 20.

Referring to FIGS. 3A and 3B, a liner material 30 is deposited withinthe trenches 28, 32. The liner material 30 can be oxide, nitride orother low-k dielectric material, which protects the substrate material12 and/or fin structure 14 during subsequent etching processes. Inembodiments, the liner material 30 is deposited by atomic layerdeposition (ALD) or chemical vapor deposition (CVD) or plasma enhancedCVD (PECVD) processes. The liner material 30 will provide completecoverage in the wider opening 32 and the trench 28, as shown in FIG. 3B,to ensure complete protection of the source and drain regions 20 duringsubsequent etching processes to form the single diffusion break. Forexample, the liner material 30 can be deposited to a thickness of about0.5 nm to about 5 nm, and more preferably about 2.5 nm to about 3 nm;although other dimensions are contemplated herein.

In FIGS. 4A and 4B, the horizontal surfaces of the liner material 30within the trenches 28, 32 and on the surface of the masking material 24will be removed by an anisotropic etching process. This process willexpose the underlying substrate material 12, including the finstructures. In FIG. 4A, the etching process will continue to remove thefin structure within the isolation regions 22, forming trenches 34extending into the isolation region 22. Due to the tapered profile ofthe fin structures, the etching process should preferably include anisotropic etching scheme to ensure that all of the semiconductormaterial of the fin structures 14 within the isolation region 22 isremoved, thereby preventing any shorts from occurring during deviceoperation.

In FIG. 4B, the etching process will extend the trench 32 into thesubstrate material 14 (as shown by reference numeral 34) to complete thesingle diffusion break etching process. The liner material 30 willprotect the source and drain regions 20 from erosion during this etchingprocess, thereby maintaining (e.g., improving) the source drain profileand reducing any defects that may occur during the etching process.

As shown in FIGS. 5A and 5B, the trenches 28, 34, 36 are filled with aninsulator material 38. The insulator material 38 can be a low-kdielectric material deposited by a conventional CVD process, followed bya CMP process. In embodiments, the low-k dielectric material can be SiN,low-k SiCOH or other dielectric materials. As shown in FIG. 5B, forexample, the liner material 30 will be an intervening layer between theliner 18 and the insulator material 38 at an upper portion of thetrench, in addition to an intervening layer between the substratematerial 14 and the insulator material 38 at a lower portion of thetrench. As to the latter feature, the liner material 30 protects theepitaxial source and drain regions 20 ensuring that the volume or theprofile of the epitaxial source and drain regions 20 will not beaffected by the processing steps forming the single diffusion break. Itis also contemplated that the upper portion of the liner material 30,adjacent to the sidewall spacer material 18, can be removed prior to thedeposition of the low-k dielectric material (see, e.g., FIG. 7).

FIGS. 6A and 6B are cross-sectional views which show replacement metalgate structures, amongst other features, and respective fabricationprocesses. More specifically, in FIGS. 6A and 6B, the polysiliconmaterial of the dummy gate structures are removed and replaced withreplacement gate materials 42, 44. In embodiments, polysilicon materialof the dummy gate structures can be removed by a selective etchchemistry process. The material 42 can be composed of a high-kdielectric material and a metal material, e.g., tungsten or otherworkfunction metal, and the material 44 can be a capping material suchas nitride. In embodiments, the materials 42, 44 can be deposited by aconventional deposition process, followed by a CMP process.

Still referring to FIGS. 6A and 6B, the sacrificial isolation regions,e.g., oxide, is removed by a conventional selective etch chemistryprocess and replaced with a contact material 46 in contact with thesource and drain regions 20. In embodiments, the contact material 46 canbe aluminum or copper, as examples.

As should be understood by those of skill in the art, the source anddrain regions 20 can undergo a silicide process prior to contactformation. The silicide begins with deposition of a thin transitionmetal layer, e.g., nickel, cobalt or titanium, over fully formed andpatterned semiconductor devices (e.g., doped or ion implanted source anddrain regions 20). After deposition of the material, the structure isheated allowing the transition metal to react with exposed silicon (orother semiconductor material as described herein) in the active regionsof the semiconductor device (e.g., source, drain, gate contact region)forming a low-resistance transition metal silicide. Following thereaction, any remaining transition metal is removed by chemical etching,leaving silicide contacts in the active regions of the device. It shouldbe understood by those of skill in the art that silicide contacts willnot be required on the devices, when a gate structure is composed of ametal material.

The method(s) as described above is used in the fabrication ofintegrated circuit chips. The resulting integrated circuit chips can bedistributed by the fabricator in raw wafer form (that is, as a singlewafer that has multiple unpackaged chips), as a bare die, or in apackaged form. In the latter case the chip is mounted in a single chippackage (such as a plastic carrier, with leads that are affixed to amotherboard or other higher level carrier) or in a multichip package(such as a ceramic carrier that has either or both surfaceinterconnections or buried interconnections). In any case the chip isthen integrated with other chips, discrete circuit elements, and/orother signal processing devices as part of either (a) an intermediateproduct, such as a motherboard, or (b) an end product. The end productcan be any product that includes integrated circuit chips, ranging fromtoys and other low-end applications to advanced computer products havinga display, a keyboard or other input device, and a central processor.

The descriptions of the various embodiments of the present disclosurehave been presented for purposes of illustration, but are not intendedto be exhaustive or limited to the embodiments disclosed. Manymodifications and variations will be apparent to those of ordinary skillin the art without departing from the scope and spirit of the describedembodiments. The terminology used herein was chosen to best explain theprinciples of the embodiments, the practical application or technicalimprovement over technologies found in the marketplace, or to enableothers of ordinary skill in the art to understand the embodimentsdisclosed herein.

What is claimed:
 1. A structure comprising a single diffusion breakextending into a substrate between diffusion regions of adjacent gatestructures, the single diffusion break filled with an insulator materialand further comprising an undercut region lined with a liner materialwhich is between the insulator material and the diffusion regions. 2.The structure of claim 1, wherein the liner material is a low-kdielectric material.
 3. The structure of claim 2, wherein the low-kdielectric material is an oxide or nitride material.
 4. The structure ofclaim 2, wherein the liner material has a thickness of about 0.5 nm to 5nm.
 5. The structure of claim 4, wherein the liner material has athickness of about 2.5 nm.
 6. The structure of claim 1, wherein theundercut region is provided in a fin structure composed of thesubstrate.
 7. The structure of claim 6, wherein the undercut region isadjacent to the diffusion regions.
 8. The structure of claim 7, whereinthe liner material is provided above the undercut region.
 9. Thestructure of claim 8, wherein the liner material above the undercutregion is adjacent to a sidewall spacer of a metal gate.
 10. A structurecomprising: a substrate material; a plurality of metal gate structureson the substrate material and comprising sidewall spacers, metalmaterial and diffusion regions; and a single diffusion break structurebetween adjacent metal gate structures of the plurality of metal gatestructures, the single diffusion break structure comprising: an undercutregion in the substrate, adjacent to the diffusion regions; a linermaterial lining the undercut region; and an insulator material over theliner material and between the adjacent metal gate structures of theplurality of metal gate structures.
 11. The structure of claim 10,wherein the liner material is a low-k dielectric material.
 12. Thestructure of claim 11, wherein the low-k dielectric material is an oxideor nitride material.
 13. The structure of claim 12, wherein the linermaterial has a thickness of about 0.5 nm to 5 nm.
 14. The structure ofclaim 10, wherein the undercut region is provided in a fin structurecomposed of the substrate material.
 15. The structure of claim 14,wherein the substrate material is between the liner material and thediffusion regions.
 16. The structure of claim 15, wherein the linermaterial is provided above the undercut region and adjacent to thesidewall spacers of the adjacent metal gate structures.
 17. Thestructure of claim 10, wherein the liner material is structured toprotect erosion of the diffusion regions during formation of theundercut region.
 18. The structure of claim 17, wherein the undercutregion is an openings in the substrate material, adjacent to thediffusion regions.
 19. A method comprising: forming a plurality of dummygate structures over fin structures, the plurality of dummy gatestructures including sidewall spacers and sacrificial material; formingsacrificial insulator material between adjacent dummy gate structures ofthe plurality of dummy gate structures; forming a trench with anundercut region in substrate material by removing the sacrificialmaterial of at least one of the dummy gate structures, leaving thesidewall spacers intact, and removing the substrate material below theremoved sacrificial material; depositing liner material on sidewalls ofthe sidewalls of the trench including in the undercut region; extendingthe trench further into the substrate; and filling the trench withinsulator material.
 20. The method of claim 19, wherein the linermaterial is a low-k dielectric material.